Tuesday, June 24, 2008
4:00 PM Registration and Conference Check-in
Glacier Ballroom Foyer
5:00 PM Welcome Reception
Glacier Ballroom Foyer
6:00 PM Dinner
Ballroom
  Guest Speaker:
  Kate Kendall - Project Coordinator
United States Geological Service
Northern Continental Divide Grizzly Bear Study - DNA, GPS, and statistics as they apply to grizzly bears


Wednesday - June 25, 2008
7:00 AM Breakfast
7:55 AM Introduction
8:00 AM Keynote - Conference Room
  Electrochemical Processing in the Semiconductor Industry
Rajesh Krishnamurthy - ChipWorks
 
COPPER INTERCONNECTS - Session Chair: Klaus Pfeifer
8:45 AM Cu-Based ULSI Interconnect Technologies
Invited: Dan Edelstein - IBM
9:30 AM Effects of Mass Transport and Macromolecular Additives on Copper Electrodeposit Microroughness
Michael L. Free, Ravindra Bhide, and Apichart Rodchanarowan - University of Utah, Dept. of Metallurgical Engineering
9:55 AM Break
10:25 AM Influence of Plating Chemistry and Current Waveform on the Film Properties of Cu Interconnects
Qi Wang, Patrick Cheung, Wesley Cabreros, Kashmir Sahota - Spansion Inc.
10:50 AM Interaction of Barrier Seed Surface Contamination with Electro-Deposition Copper Films
Frank Smith, Sai Boyapati, Bill Brennan, Kinsang Lam, Pete Beckage, Brad Carpenter, and Brandon Brooks – Spansion, Semitool
11:30 AM Lunch
 
PROPERTIES OF ELECTROCHEMICALLY PROCESSED FILMS - Session Chair: Kevin Mikelson
1:30 PM A Novel Method For Isolating Electrodeposited Films
Nikit Phadke and Michael L. Free - University of Utah, Department of Metallurgical Engineering
1:55 PM Some Peculiarities Of Nature Of Reverse Bias Electrical Conductivity Of Niobium Pentoxide Anodic Oxide Films In Capacitor Structure On Niobium
Leonid SKATKOV, Valeriy GOMOZOV, Irina STEPANOVA, Svetlana DERIBO – PCB(Israel) and National Technical Universitet, Ukraine
2:20 PM Development of Low Stress Binary and Tertiary High-Magnetic Flux Alloy films from Electrolytic Solutions
W. Graham Yelton, and Adam Rowen - Sandia National Labs
2:45 PM Break
3:15 PM 3D Interconnect Plating and Stacking
Charles Wu - Micron
3:40 PM Electroless Nickel/Palladium/Gold As Universal Surface Finish For Soldering/ Bonding Application In Semiconductor Industry
Dr. Albrecht Uhlig, Dr. Lilly Tsai, J. Gaida, A. Taniguchi – Atotech
5:00 PM Dinner in Bigfork, MT


Thursday, June 26, 2008
7:00 AM Breakfast
8:00 AM Introduction
 
ALLOY PLATING AND CHIP PACKAGING APPLICATIONS - Session Chair: Dan Schmauch
8:05 AM The Application of Self Assembled Nanolayers to Precious Metals Electroplated Deposits
Joe Abys, Ed Kudrak, Shenliang Sun, Ted Antonellis - Cookson Electronics Enthone Inc.
8:50 AM Chemical and Electrical Methods of Inducing Shape Change in Electroplated Wafer Structures
Eric Huenger, Eric Chiu, Bob Forman - Rohm and Haas
9:15 AM All-Copper Substrate Connections (Is There Life Without Solder?)
Paul A. Kohl, Tyler Osborn, Charles Lightsey - Georgia Institute of Technology
9:40 AM Drivers for TSV Technology
E. Jan Vardaman - TechSearch International
10:05 AM TSVs are More Than Moore for Memory Application
Kyle Kirby - Micron Technology
10:30 AM Break
10:45 AM High-Speed Indium Electroplating: New Technology for Thermal Management and Interconnect
Edit Szöcs, Felix Schwager, Michael Toben, Martin Bayes, Nate Brese – Rohm and Haas
11:10 AM The Electrodeposition of Eutectic Gold-Tin Alloy for Fluxless Soldering Applications
George Hradil - Technic
11:35 AM Electroforming Bi(1-x)Sb(x) Nanowires for High-Efficiency On-Chip Thermoelectric Cooling
W. Graham Yelton and Michael P. Siegal - Sandia National Labs, Jennifer Keyani and Angelica M. Stacy - Department of Chemistry, University of California, Berkeley CA
12:00 PM Lunch


2:00 PM


POSTER SESSION
5:00 PM "The Wings of Freedom Tour" - View Collings Foundation WWII Planes
6:00 PM Dinner - Semitool Hangar (Glacier Park International Airport)


Friday, June 27, 2008
7:45 AM Breakfast
8:45 AM Introduction
 
CHEMICAL ANALYSIS OF ELECTROLYTES - Session Chair: Shea Cordial
8:50 AM Analytics for Electroless Processes
Jürg Stahl - Ancosys
9:15 AM Electrochemical Express Analysis of Copper Plating Processes used in Microelectronics
Michael Pavlov, Eugene Shalyt and Peter Bratin - ECI Technology
9:45 AM Copper ECD Process Control By Means Of Electroanalysis Coupled With PARAllel FACtor Analysis (PARAFAC) Multi-Way Data Decomposition Chemometric Technique
Aleksander Jaworski, Hanna Wikiel, and Kazimierz Wikiel - Technic, Inc.
10:10 AM Keep the Motor Running — Moore’s Law, 450mm, and How We Keep This Industry In Gear
G. Dan Hutcheson - VLSI Research, Inc.
10:35 AM Conference Wrap-up
11:30 AM BBQ - Glacier National Park
Fish Creek Picnic Area
Red Bus Tours Depart from Village Inn at Apgar 2:00 PM